Estimates of differential sputtering yields for deposition applications

Abstract

Angular and angle-resolved energy distributions of neutral atoms sputtered from elemental targets under ion bombardment are investigated by numerical and analytic modeling. Special emphasis is made on sub-keV ion bombardment, which is typical for sputter deposition sources. Scaling laws that define the distribution anisotropies are formulated. An approximate semiempirical description is suggested for anisotropic energy distributions.