Chemical Nanolithography with Electron Beams

Abstract

A highly focused electron beam as the agent for spatially selective reductionof nitro groups to amino groups in a self-assembled monolayer of aromatics is the key feature of a novel technique in chemical nanolithography presented here. Treatment of the reactive amino groups with different reactants after each e-beam writing step yields a surface with a defined array of chemically diverse structures; for example, see the line pattern in the Figure.