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Determination of (n,k) for absorbing thin films using reflectance measurements
21
Citations
12
References
1988
Year
Optical MaterialsEngineeringReflectance MeasurementsOptical TestingAbsorption SpectroscopyElectromagnetic MetamaterialsSurface ReflectanceOptical PropertiesReflectanceThin Film ProcessingMaterials ScienceComplex Refractive IndexMonitoring Wavelength LambdaFilm GeometryDepth-graded Multilayer CoatingSurface CharacterizationSpectroscopyApplied PhysicsLight AbsorptionThin Films
We propose a method for determination of the complex refractive index of absorbing materials either in bulk or film geometry by measuring its reflectivity when coated with a well-characterized transparent dielectric at two specific optical thicknesses: n(1)d(1) = lambda(0)/4 and n(1)d(1) = lambda(0)/2. The complex refractive index of the sample ñ = (n,k) is calculated for the monitoring wavelength lambda(0). The selected optical thicknesses of the coating allow the calculation of its geometrical thickness, therefore the variation of ñ with wavelength in the region where the reflectivity is measured can be determined.
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