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GaAs quantum dots with lateral dimension of 25 nm fabricated by selective metalorganic chemical vapor deposition growth
65
Citations
22
References
1994
Year
Materials ScienceSitu FabricationIi-vi SemiconductorPhotoluminescenceSelective Epitaxial GrowthEngineeringNanotechnologyNanoelectronicsApplied PhysicsQuantum DotsDot StructuresMolecular Beam EpitaxyEpitaxial GrowthOptoelectronicsChemical Vapor DepositionCompound SemiconductorLateral DimensionSemiconductor Nanostructures
We report on in situ fabrication and the photoluminescence spectra of pyramid-shaped GaAs dot structures grown on (100) GaAs substrates using selective epitaxial growth by metalorganic chemical vapor deposition. The dot structures have lateral size of 25 nm and the period of 140 nm, showing a clear photoluminescence peak with strong intensity. In addition, energy change of magnetophotoluminescence spectra demonstrates the enhancement of exciton binding energy due to lateral confinement.
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