Design of a magnetic-pole enhanced inductively coupled plasma source

Abstract

The trend towards large-area substrates stressed by the semiconductor and flat panel display (FPD) industries is propelling the large-area plasma source developments. In this work, a novel inductively coupled plasma source enabling large-area plasma production is presented: the magnetic-pole-enhanced inductively coupled plasma source (MaPE-ICP). The plasma source is based on the use of a coil inductor embedded within a high magnetic permeability pole to enhance the magnetic coupling between the coil and the plasma.