Publication | Closed Access
An investigation into the performance of diffusion barrier materials against copper diffusion using metal-oxide-semiconductor (MOS) capacitor structures
31
Citations
14
References
1999
Year
Materials ScienceCopper DiffusionEngineeringDiffusion ResistanceNanoelectronicsOxide ElectronicsApplied PhysicsDiffusion Barrier MaterialsSemiconductor MaterialCapacitor StructuresElectronic PackagingMicroelectronicsCharge Carrier Transport
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