Publication | Closed Access
Hierarchical Nanostructures by Sequential Self‐Assembly of Styrene‐Dimethylsiloxane Block Copolymers of Different Periods
102
Citations
41
References
2010
Year
EngineeringHierarchical NanostructuresPolymer NanotechnologyMolecular Self-assemblyResponsive PolymersNanostructured PolymerHierarchical ProcessPolymer NanocompositesChemistrySequential Self‐assemblyPolymersMacromolecular EngineeringBlock CopolymersPolymer ProcessingPolymer ChemistryNanolithography MethodMaterials ScienceNanomanufacturingHierarchical AssemblyConventional LithographyBlock Co-polymersNanomaterialsMicrofabricationSelf-assemblyPolymer ScienceNatural SciencesPolymer CharacterizationPolymer Self-assemblyStyrene‐dimethylsiloxane Block Copolymers
Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS of a 34–40 nm period, which is itself templated by micron-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10 nm features and registering them on the substrate.
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