Chemical Vapor Deposition · 2001 · 20 citations · 0 references
Natural SciencesChemistryMaterials ScienceMaterials ChemistrySolid-state ChemistryThin FilmsHigh-temperature MaterialsThermal Properties Of MaterialsThermogravimetric AnalysisThin Film Thermal PropertiesThermal DecompositionThermal Decomposition ReactionsThermal StabilityThermochemistry Of OxidesTitanium OxidesVapor Pressure
A study of the thermal behavior of Ti(dpm)2(OiPr)2, used as a source compound to obtain TiO2 films, was carried out. Ti(dpm)2(OiPr)2 was synthesized by an original technique. Data on vapor pressure and composition, thermal stability, and decomposition products of the compound were obtained, both in vacuo and in the presence of oxygen. A mechanism is suggested for the thermal decomposition of a vapor on a hot surface.