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Evidence for the presence of U–Mo–Al ternary compounds in the U–Mo/Al interaction layer grown by thermal annealing: a coupled micro X-ray diffraction and micro X-ray absorption spectroscopy study
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Citations
10
References
2007
Year
Aluminium NitrideEngineeringU–mo–al Ternary CompoundsSolid-state ChemistryChemistryInorganic MaterialThermal AnnealingUmo 2Low Mo SolubilityMaterials EngineeringInorganic ChemistryMaterials ScienceMo 4U–mo/al Interaction LayerCrystallographyTransition Metal ChalcogenidesSurface ScienceApplied PhysicsAlloy Phase
The systematic presence of the ternary phases U 6 Mo 4 Al 43 and UMo 2 Al 20 is reported in a U–Mo/Al interaction layer grown by thermal annealing. This work shows, therefore, the low Mo solubility in UAl 3 and UAl 4 binary phases; it contradicts the hypothesis of the formation of (U,Mo)Al 3 and (U,Mo)Al 4 solid solutions often admitted in the literature. Using µ-XAS (micro X-ray absorption spectroscopy) at the Mo K edge and µ-XRD (micro X-ray diffraction), the heterogeneity of the interaction layer obtained on a γ-U 0.85 Mo 0.15 /Al diffusion couple has been precisely investigated. The UMo 2 Al 20 phase has been identified at the closest location from the Al side. Moreover, µ-XRD mapping performed on an annealed fuel plate enabled the characterization of the four phases resulting from the γ-U 0.85 Mo 0.15 /Al and (U 2 Mo + α-U)/Al interactions. A strong correlation between the concentrations of UAl 4 and UMo 2 Al 20 and those of UAl 3 and U 6 Mo 4 Al 43 has been shown.
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