Publication | Closed Access
Study of plasma mechanisms of hybrid a-SiOC:H low-k film deposition from decamethylcyclopentasiloxane and cyclohexene oxide
20
Citations
6
References
2005
Year
Cyclohexene OxideChemical EngineeringEngineeringPlasma MechanismsSurface ScienceApplied PhysicsChemistryChemical DepositionChemical Vapor DepositionHybrid A-siocPlasma ProcessingThin Film Processing
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