Vacuum ultraviolet driven chemical vapor deposition of localized aluminum thin films

Abstract

Incoherent vacuum ultraviolet (VUV) light has been used to deposit aluminum from photodissociated trimethylaluminum vapor at room temperature. The depositions of aluminum on quartz, silicon, and sapphire show distinct patterns of the shadow mask that was used to shield areas of the substrate from the VUV light beam. Because of its simplicity and low cost, this new method may provide an attractive alternative to presently used methods for depositing metals, semiconductors, and insulators.