Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistry - Concepedia

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Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistry

18

Citations

11

References

2003

Year

C. H. Oh, Nae‐Eung Lee, Jaehoon Kim, Geun Yong Yeom, Seong‐Sik Yoon, Taesoon Kwon

Surface and Coatings Technology

Chemical EngineeringElectrical EngineeringC4f8/o2/ar ChemistryEngineeringPecvd ChamberN-containing Additive GasesGas Discharge PlasmaNonthermal PlasmaPlasma Processing

References

	Year	Citations

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