Application of the Nitritation and Anammox Process into Inorganic Nitrogenous Wastewater from Semiconductor Factory

Abstract

The first full-scale nitritation and anaerobic ammonium oxidation (Anammox) processes for an inorganic wastewater of semiconductor factory were installed and performances were evaluated. Existing facilities of conventional nitrification and denitrification were retrofitted to a combination of the nitritation and Anammox process. Novel nitritation method, selective acceleration of ammonia oxidation by high concentration of inorganic carbon, was evaluated in full-scale aeration tank with carrier material. The ammonia conversion rate of the nitritation reactor was in the range of 0.27–0.48 kg NO2-N/m3 day after start-up period, and stable nitritation was achieved for over 10 months. In an Anammox reactor, on-site cultivation of anammox bacteria was performed, and the most plausible reason for slower nitrogen conversion at the beginning was oxygen contamination into the reactor. After minimizing influence of oxygen contamination, design loading was achieved within 3 months of operation. After start-up period, stable Anammox reactions are maintained for over 10 months. The nitrogen removal rate after start-up period was in the range of 1.04–3.29 kg N/m3 day . In combination with conventional denitrification process, soluble nitrogen in the final effluent was reduced below 8 mg/L.