Publication | Closed Access
Optimization of a-Si1−xCx: H films prepared by ultrahigh vacuum plasma enhanced chemical vapour deposition for electroluminescent devices
30
Citations
15
References
1994
Year
Materials ScienceEngineeringChemical Vapour DepositionNanotechnologySurface ScienceApplied PhysicsVacuum DeviceThin FilmsChemical Vapor DepositionH FilmsPlasma ProcessingUltrahigh Vacuum PlasmaSilicon On InsulatorThin Film Processing
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