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Low-frequency electric microfield distributions in a plasma containing multiply-charged ions: Extended calculations
59
Citations
4
References
1977
Year
EngineeringPlasma SciencePlasma PhysicsElectric Microfield DistributionsLaser Plasma PhysicsPlasma SimulationPlasma TheoryPlasma ComputationParameter RangesIon BeamPlasma ConfinementComputational ElectromagneticsIon EmissionPlasma DiagnosticsPhysicsDifferent Kinetic TemperaturesApplied Plasma PhysicAtomic PhysicsLaboratory Plasma PhysicsApplied PhysicsPlasma ApplicationMultiply-charged Ions
The formalism needed for the computation of electric microfield distributions in plasmas is extended as follows: (i) The perturbing ions and electrons in the plasma are allowed to have different kinetic temperatures; (ii) two species of perturbing ions, of charge ${Z}_{1}$ and ${Z}_{2}$, may be present in any given proportion. Computed results are presented graphically for parameter ranges which are of interest in the study of laser-produced plasmas.
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