Characterization of a Magnetron Plasma for Deposition of Titanium Oxide and Titanium Nitride Films

Abstract

Abstract Experimental results for the energy distribution of electrons and plasma ions in a magnetron discharge with a titanium target and with pure argon, argon/nitrogen and argon/oxygen mixtures as working gas are reported. Typical electron temperatures measured 6.5 … 9.5 cm above the magnetron target range between 2–3.5 eV. Typical values for the plasma potential are in the 0.4–2 V range, as are mean ion energies measured with the help of energy‐resolved mass spectrometry. Deposited titanium films show some dependencies on oxygen flow and on substrate bias. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)