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Unipolar resistive switching characteristics of ZnO thin films for nonvolatile memory applications
466
Citations
11
References
2008
Year
Non-volatile MemoryEngineeringThin Film Process TechnologyPhase Change MemorySteady Bistable ResistanceSemiconductorsNanoelectronicsRadio Frequency MagnetronThin Film ProcessingMaterials ScienceElectrical EngineeringOxide ElectronicsNonvolatile Memory ApplicationsSemiconductor MaterialMicroelectronicsSpecific ResistanceApplied PhysicsSemiconductor MemoryThin FilmsZno Thin FilmsResistance States
Highly (002)-oriented and columnar-grained ZnO thin films were prepared by radio frequency magnetron sputtering at room temperature. The Pt∕ZnO∕Pt devices exhibit reversible and steady bistable resistance switching behaviors with a narrow dispersion of the resistance states and switching voltage. Only a low forming electric field was required to induce the resistive switching characteristics. The resistance ratios of high resistance state to low resistance state were in the range of 3–4 orders of magnitude within 100cycles of test. It was also found that the conduction mechanisms dominating the low and high resistance states are Ohmic behavior and Poole-Frenkel emission, respectively.
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