Synthesis of Photoacid Generator-Containing Patternable Diblock Copolymers by Reversible Addition−Fragmentation Transfer Polymerization

Abstract

Novel well-defined, patternable diblock copolymers containing photoacid-generating sulfonium and acid-sensitive ester units in one of the blocks were synthesized by reversible addition−fragmentation transfer polymerization, and their self-assembling as well as lithographic properties were investigated.