Applied Physics Letters · 1983 · 92 citations · 20 references
Natural SciencesMaterials EngineeringMaterials ScienceInterface ScienceMaterials ChemistrySurface ScienceAuger Electron SpectroscopyInterface EngineeringInterface PhysicsSemiconductor InterfacesSemiconductor SurfacesSurface PhysicsAnnealingAnnealing Temperature EffectsEnergy Loss ProcessesEnergy Loss SpectraInterface FormationMetal-semiconductor InterfacesSilicon Carbide (Sic) MaterialsSurface Annealing
Auger and electron energy-loss spectroscopies, as functions of Al coverage and annealing temperature, have been used to determine the mechanism of formation of the Al/SiC interface. Al deposited at room temperature forms quasi-metallic islands randomly distributed over the surface. Annealing at moderate temperature (≤600 °C) causes aggregation of Al at C-rich sites. At higher temperature, Al reacts with C (but not with Si) to form Al4C3.
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P.G. Lurie, J.M. Wilson · Surface Science · 1977 · 281 citations
<i>Introduction to the Properties of Crystal Surfaces</i>
J. M. Blakely, W. R. Bottoms · Physics Today · 1975 · 170 citations