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Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl2/N2 and Cl2/Ar Mixtures at Low Bias Power
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2007
Year
Materials ScienceMaterials EngineeringCl2/ar MixturesEngineeringPhysicsApplied PhysicsVacuum DeviceMicroelectronicsPlasma EtchingOptoelectronicsPlasma ApplicationLow Bias PowerAnisotropic Etching
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