Pseudomorphic InAsSb multiple quantum well injection laser emitting at 3.5 μm

Abstract

A pseudomorphic, compressively strained InAs0.94Sb0.06 multiple quantum well injection laser, emitting in the 3.5–3.6 μm range is reported. The device was grown by metalorganic chemical vapor deposition, and x-ray and optical characterization indicate that the active region has a very low dislocation density. In pulsed mode, the laser operated at 135 K and displayed a characteristic temperature of 33 K, equaling the highest value reported for molecular-beam epitaxy grown, InAsSb/InAlAsSb active region lasers of comparable wavelength. Factors limiting the performance of these lasers are discussed.