Publication | Closed Access
Structural and optical characterization of CdS films grown by photochemical deposition
110
Citations
15
References
1999
Year
Optical MaterialsEngineeringChemistryOptical CharacterizationBand GapSemiconductor NanostructuresSemiconductorsIi-vi SemiconductorCompound SemiconductorThin Film ProcessingMaterials ScienceCrystalline DefectsOptoelectronic MaterialsPhotochemical DepositionCds Thin FilmsSemiconductor MaterialApplied PhysicsCds FilmsThin FilmsOptoelectronicsChemical Vapor DepositionSolar Cell Materials
CdS thin films are grown by photochemical deposition from an aqueous solution and characterized by x-ray diffraction (XRD), Raman spectroscopy, photoluminescence measurement, and optical transmission spectroscopy. The films are deposited at room temperature and annealed at temperatures up to 500 °C. The as-deposited film is dominantly zinc blende cubic. The cubic phase remains dominant until the annealing temperature becomes higher than 400 °C. By the annealing at 450 °C, the XRD pattern turns to that of hexagonal phase. Moreover, its peak width decreases and the near-band-edge luminescence begins to be observed. The band gap is decreased by annealing below 400 °C and then abruptly increased by the annealing at 450 °C. This annealing behavior of the band gap is interpreted considering the quantum size effects, the band tail due to disorder, and the cubic-hexagonal transition.
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