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<title>Illumination optics design for EUV lithography</title>
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2000
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EngineeringElectron-beam LithographyOptic DesignDifferent SolutionsEducationComputational IlluminationIllumination ModelingBeam LithographyOptical System DesignOptical SystemsInstrumentationIllumination Optics DesignOphthalmologyDesignOptical MeasurementConical ReflectionGeometrical OpticPhotometry (Optics)TechnologyIllumination RequirementsOptical System Analysis
In this paper, a comparison of two different solutions for the illuminator is presented. The systems are intended to comply with the illumination requirements, but have different advantages and drawbacks. The examples represent solutions based on conical reflection and on a fly's-eye integrator. A comparison is given and the potentials of the different solutions are outlined.