Direct patterning of carbon nanotube network devices by selective vacuum filtration

Abstract

We report on a method which allows direct patterning of density controlled carbon nanotube network (NTN) devices during network formation. By lithographically patterning photoresist on the filter membrane, the nanotubes in suspension were guided to the exposed pattern areas of the filter surface during vacuum filtration allowing in situ device formation. The NTNs were transferred to an elastomer substrate by directly curing polydimethylsiloxane on its surface. We compared electrical characteristics of NTN patterns fabricated simultaneously using this method and found that the different NTNs with equal nanotube density showed reproducible characteristics.