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2.12 μm InGaAs–InGaAlAs–InP diode lasers grown in solid-source molecular-beam epitaxy
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2000
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PhotonicsRoom TemperatureEngineeringLaser ScienceSemiconductor LasersCharacteristic TemperatureSolid-source Molecular-beam EpitaxyApplied PhysicsLaser ApplicationsLaser MaterialQuantum Photonic DeviceMolecular Beam EpitaxyEpitaxial GrowthOptoelectronicsHigh-power LasersCompound Semiconductor
We have fabricated InGaAs–InGaAlAs–InP strained quantum well lasers with wavelength as long as 2.12 μm in solid-source molecular-beam epitaxy. A continuous-wave threshold current density of 780 A/cm2 at room temperature and a characteristic temperature of 48 K have been achieved.
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