Publication | Closed Access
Inductively coupled plasma reactive ion etching of titanium nitride thin films in a Cl2/Ar plasma
18
Citations
8
References
2008
Year
Materials ScienceEngineeringNanoelectronicsSurface ScienceApplied PhysicsThin FilmsChemical Vapor DepositionPlasma ApplicationPlasma EtchingCl2/ar PlasmaPlasma Processing
| Year | Citations | |
|---|---|---|
Page 1
Page 1