Characterization of Cat-CVD grown Si–C and Si–C–O dielectric films for ULSI applications - Concepedia

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Characterization of Cat-CVD grown Si–C and Si–C–O dielectric films for ULSI applications

19

Citations

5

References

2003

Year

K. Takatsuji, Masaki Kawakami, Y. Makita, Kenji Murakami, Hiroshi Nakayama, Y. Miura, N. Shimoyama, H. Machida

Thin Solid Films

Materials ScienceSemiconductor TechnologyEngineeringSi–c–o Dielectric FilmsApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationThin FilmsCat-cvd Grown Si–cUlsi ApplicationsSemiconductor Device

References

	Year	Citations

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