Applied Physics Letters · 1995 · 14 citations · 0 references
Materials EngineeringMaterials ScienceSrxba1−xnb2o6 FilmsOptical MaterialsEngineeringBulk CrystalsPhysicsEpitaxial GrowthOptical PropertiesApplied PhysicsChemical Vapor DepositionThin FilmsPulsed Laser DepositionChemical DepositionMolecular Beam EpitaxyMgo SubstratesThin Film Processing
SrxBa1−xNb2O6 films have been epitaxially grown on MgO substrates by a single-source plasma-enhanced chemical vapor deposition (PE-CVD). Exceptionally high quality of the epitaxial films was observed as indicated by high-resolution synchrotron x-ray diffraction imaging. The films exhibit waveguiding behavior with values of refractive index and the linear electro-optic coefficient r51 close to those of bulk crystals.