Deposition rate optimization in SiH4/H2 PECVD of hydrogenated microcrystalline silicon - Concepedia

Concepedia

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Deposition rate optimization in SiH4/H2 PECVD of hydrogenated microcrystalline silicon

23

Citations

7

References

2001

Year

E. Amanatides, D. Mataras, D. Rapakoulias

Thin Solid Films

Materials EngineeringMaterials ScienceWafer Scale ProcessingEngineeringMicrofabricationApplied PhysicsSemiconductor Device FabricationChemical DepositionSilicon On InsulatorDeposition Rate OptimizationChemical Vapor Deposition

References

	Year	Citations

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