Concepedia

Correlation between plasma conditions and properties of (Ti,Al)N coatings deposited by PECVD

O. Kyrylov, R. Cremer, D. Neuschütz, Robbyn Prange

Surface and Coatings Technology · 2002 · 14 citations · 13 references

DOI

Concepts

References

13

On structure and properties of sputtered Ti and Al based hard compound films

O. Knotek, M. Böhmer, T. Leyendecker · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 397 citations

, , +17

Superhard nanocomposite Ti1−Al N films prepared by magnetron sputtering

J. Musil, H. Hrubý · Thin Solid Films · 2000 · 256 citations

, , +11

Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition

G. Håkansson, J.‐E. Sundgren, D.C. McIntyre et al. · Thin Solid Films · 1987 · 238 citations

, , +16

On the structure of (Ti, Al)N-PVD coatings

O. Knotek, T. Leyendecker · Journal of Solid State Chemistry · 1987 · 111 citations

, , +12

Comparative studies of TiN and Ti1−xAlxN by plasma-assisted chemical vapor deposition using a TiCl4/AlCl3/N2/H2/Ar gas mixture

Kwang Ho Kim · Thin Solid Films · 1996 · 76 citations

, , +15