Applied Physics Letters · 2007 · 51 citations · 14 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsCarrier TransportSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor InterfacesSemiconductor PhysicsWide Band Gap SemiconductorsBackside IlluminationCapacitance MeasurementCapacitance-voltage CharacterizationCapacitance-voltage MeasurementsConduction BandHeterojunctionsMolecular Beam EpitaxySchottky Barriers
The conduction-band offset between GaN and InN is experimentally determined. InN∕n-type GaN isotype heterojunctions grown by molecular beam epitaxy are observed to exhibit Schottky-junction like behavior based on rectifying vertical current flow. From capacitance-voltage measurements on the heterojunction, the Schottky barrier height is found to be ∼0.94eV. The photocurrent spectroscopy measurement by backside illumination reveals an energy barrier height of 0.95eV across the heterojunction, consistent with the capacitance measurement. By combining electrical transport, capacitance-voltage, and photocurrent spectroscopy measurement results, the conduction band offset between InN and GaN is estimated to be ΔEC=1.68±0.1eV.
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Negative Field-Effect Mobility on (100) Si Surfaces
F. F. Fang, W. E. Howard · Physical Review Letters · 1966 · 525 citations