Computational Studies on the Shape and Control of Plasmas in Magnetron Sputtering Systems

Abstract

The three-dimensional motions of electrons are traced in magnetron sputtering systems. Electrons are emitted from a cathode and show drift motion. Collisions between electrons and neutral gas atoms of Ar are examined using the Monte Carlo method. The distribution of ionization points is used to show the shape of plasmas. The results of the simulations are as follows. The profiles of plasma distribution correspond to the shape of the magnetic field. The shape of erosion profile caused by sputtering agrees well with the plasma profile. The increase of ionization points is obtained by increasing the neutral gas pressure.