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Noninteger InAs monolayer well InAs/GaAs single quantum well structures grown by metalorganic chemical vapor deposition
31
Citations
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References
1988
Year
Ii-vi SemiconductorQuantum ScienceElectrical EngineeringNoninteger Inas MonolayerEngineeringPhotoluminescencePhysicsGrown WellsApplied PhysicsInas/gaas Single QuantumMolecular Beam EpitaxyEffective Interface PositionOptoelectronicsCompound SemiconductorSemiconductor Nanostructures
InAs/GaAs single quantum well structures have been grown by metalorganic chemical vapor deposition. The grown wells are 1.03, 1.3, and 1.7 InAs monolayers thick. The 4 K photoluminescence spectra exhibit strong and narrow peaks, their energy decreasing smoothly with increasing well thickness. The noninteger value is interpreted on the model that the interface is macroscopically flat but has valleys and hills with their lateral extent smaller than excitons. The effective interface position is determined by their relative lateral extent.
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