Fabrication of large scale periodic magnetic nanostructures

Abstract

We report on the fabrication of large scale periodic magnetic nanostructures designed as possible candidates for a future application in magnetic data storage technology. The nanostructures are prepared on glass substrates by electron beam evaporation of Fe or Co onto photoresist masks, which are periodically patterned using optical interference lithography with an Ar+ laser (λ=457.8 nm) in combination with subsequent selective etching. We present our first results on the fabrication of periodic arrays of isolated magnetic dots with an average diameter of 600 nm and periodicity of 900 nm over areas of 5 cm2.