Reactive ion etching characterization of a-SiC: H in CF4/O2 plasma - Concepedia

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Reactive ion etching characterization of a-SiC: H in CF4/O2 plasma

16

Citations

10

References

1995

Year

Giovanni Saggio, É. Verona, Paolo Rosa, S. La Monica, R. Salotti, L. Schirone

Materials Science and Engineering B

Materials ScienceElectrical EngineeringEngineeringNanoelectronicsSurface ScienceApplied PhysicsCarbideMicroelectronicsPlasma EtchingPlasma ProcessingReactive Ion

References

	Year	Citations

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