Publication | Closed Access
PREPARATION AND PROPERTIES OF HIGH-PURITY EPITAXIAL GaAs GROWN FROM Ga SOLUTION
49
Citations
7
References
1967
Year
Materials EngineeringMaterials ScienceSemiconductorsEngineeringPhysicsCrystalline DefectsOptoelectronic MaterialsApplied PhysicsGa SolutionGallium OxideSemiconductor MaterialElectron MobilitiesOptoelectronic DevicesMolecular Beam EpitaxyEpitaxial GrowthGaas Single CrystalsCompound Semiconductor
GaAs single crystals were grown epitaxially from Ga solution with carrier concentrations in the 1014 cm-3 range and electron mobilities between 7500 and 9300 cm2/V-sec at 300°K, and 50,000 and 95,000 cm2/V-sec at 77°K. A comparison of the theoretical and experimental curves for the mobility vs temperature indicates that the significant scattering mechanisms are ionized impurities and phonons in the temperature range of 77°K to 430°K. This indicates that the epitaxial layers do not contain other mobility-limiting imperfections to a significant degree. Photoluminescence spectra of the epitaxial layers did not show any emission due to keep lying imperfection levels.
| Year | Citations | |
|---|---|---|
Page 1
Page 1