Publication | Closed Access
Ultrafast recombination and trapping in amorphous silicon
98
Citations
13
References
1990
Year
Transient GratingPhotonicsEngineeringPhysicsOptical PropertiesFemtosecond Laser PulsesApplied PhysicsReflectivity TransientsSemiconductor Device FabricationAmorphous SolidPulsed Laser DepositionOptoelectronicsUltrafast RecombinationSilicon On InsulatorCrystalline Semiconductors
We have studied the time-resolved reflectivity and transmission changes induced by femtosecond laser pulses in hydrogenated and nonhydrogenated amorphous silicon thin films, a-Si:H and a-Si, respectively. By varying the pump power, and hence the photoexcited free-carrier densities, by several orders of magnitude, a quadratic, nonradiative recombination process has been identified that controls the density of free carriers on a picosecond time scale for excitation levels above 5\ifmmode\times\else\texttimes\fi{}${10}^{18}$ ${\mathrm{cm}}^{\mathrm{\ensuremath{-}}3}$ in a-Si:H and above 5\ifmmode\times\else\texttimes\fi{}${10}^{19}$ ${\mathrm{cm}}^{\mathrm{\ensuremath{-}}3}$ in a-Si. At lower free-carrier densities, the reflectivity transients display the dynamics expected from a trapping mechanism. We suggest that the process that dominates for the higher free-carrier densities may result from Auger recombination but with a dependence on the carrier density that is different from that which has been observed in crystalline semiconductors where k selection prevails.
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