Publication | Closed Access
Change of InAs/GaAs quantum dot shape and composition during capping
107
Citations
26
References
2008
Year
Materials ScienceIi-vi SemiconductorEngineeringTunneling MicroscopyPhysicsQuantum Dot GrowthNanotechnologyNanoelectronicsSurface ScienceApplied PhysicsQuantum MaterialsQuantum DotsCross-sectional ScanningQuantum DeviceOptoelectronicsCompound SemiconductorSemiconductor Nanostructures
Using plan-view and cross-sectional scanning tunneling microscopy, the shape and composition of InAs/GaAs quantum dots are investigated before and after capping by GaAs. During capping, the original pyramidally shaped quantum dots become truncated, resulting in a flat (001) top facet and steeper side facets. The InAs quantum dots are found to be intermixed at their top with GaAs due to material rearrangement. Since the bottom interface of quantum dots and wetting layer is always sharp, this intermixing occurs during capping and not during quantum dot growth. Considering strain energies, a model for the capping is presented.
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