Low pressure chemical vapor deposition of silicon nitride using the environmentally friendly tris(dimethylamino)silane precursor - Concepedia

Concepedia

Publication | Closed Access

Low pressure chemical vapor deposition of silicon nitride using the environmentally friendly tris(dimethylamino)silane precursor

26

Citations

10

References

1996

Year

R. Lévy, Xi Lin, J. M. Grow, H. J. Boeglin, R. B. Shalvoy

Journal of materials research/Pratt's guide to venture capital sources

Chemical EngineeringEngineeringSilane PrecursorSurface ScienceApplied PhysicsFriendly TrisSemiconductor Device FabricationChemistryChemical DepositionSilicon On InsulatorChemical Vapor Deposition

References

	Year	Citations

Page 1