Oxygen pressure as a parameter in the D.C. plasma anodization of silicon - Concepedia

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Oxygen pressure as a parameter in the D.C. plasma anodization of silicon

17

Citations

3

References

1980

Year

Romuald B. Beck, M.J. Patyra, Jerzy Rużyłło, A. Jakubowski

Thin Solid Films

EngineeringNonthermal PlasmaApplied PhysicsD.c. Plasma AnodizationGas Discharge PlasmaMicroelectronicsPlasma ProcessingOxygen Pressure

References

	Year	Citations

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