Journal of Physics D Applied Physics · 2007 · 114 citations · 24 references
Magnetic PropertiesEngineeringLaser DepositionMagnetite Thin FilmsThin Film Process TechnologyMagnetic MaterialsMagnetismFerroelectric ApplicationPulsed Laser DepositionEpitaxial GrowthThin Film ProcessingMaterials Scienceα-Fe2o3 TargetCrystalline DefectsFe3o4 FilmsOxide ElectronicsLaser-assisted DepositionMagnetic MaterialFerromagnetismNatural SciencesSurface ScienceApplied PhysicsThin FilmsAmorphous Substrates
We have deposited magnetite thin films using the pulsed laser deposition technique from a α-Fe2O3 target on different substrates (Si (1 1 1), GaAs (1 0 0), Al2O3 (0 0 1) and amorphous float glass (FG)) without any buffer layer at a substrate temperature of 450 °C. These films have been characterized by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), Raman spectroscopy, ac magnetic susceptibility and four-probe resistivity. The XRD results of these films show highly (1 1 1) oriented growth and single phase nature of Fe3O4 films on all substrates. Fe 2p core level x-ray photoelectron spectra and Raman spectra reveal the formation of Fe3O4 throughout the thickness of the films. All films show a Verwey transition at or around 120 K. It is observed that the oriented growth of Fe3O4 films takes place along the [1 1 1] direction on these substrates, which have either a huge lattice mismatch or no matching at all (as in FG) with Fe3O4.
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