XPS analysis of wet chemical etching of GaAs(110) by Br2–H2O: comparison of emersion and model experiments - Concepedia

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XPS analysis of wet chemical etching of GaAs(110) by Br2–H2O: comparison of emersion and model experiments

29

Citations

23

References

2000

Year

M. M. Beerbom, O. Henrion, Andreas Klein, Thomas Mayer, Wolfram Jaegermann

Electrochimica Acta

SemiconductorsSemiconductor TechnologyElectrical EngineeringChemical EngineeringEngineeringXps AnalysisSurface ScienceApplied PhysicsPlasma EtchingWet Chemical EtchingCompound SemiconductorModel Experiments

References

	Year	Citations

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