Surface chemistry of a new III–V MOCVD reactant: PhAsH2 on GaAs(100) - Concepedia

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Surface chemistry of a new III–V MOCVD reactant: PhAsH2 on GaAs(100)

12

Citations

5

References

1991

Year

Andreas Schütze, J. Zacheja, M. Weyers, D. Köhl

Journal of Crystal Growth

SemiconductorsEngineeringSurface ChemistrySurface ScienceApplied PhysicsChemistryCompound SemiconductorChemical Vapor Deposition

References

	Year	Citations

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