Submicrometer GaAs MESFET with shallow channel and very high transconductance

Abstract

A 0.5-µm GaAs MESFET with a 25-nm thin channel, 400- mS/mm maximum transconductance, and 580-mS/V.mm K value is presented. This extremely high K value was obtained using an electron-beam fabricated recessed-gate MESFET structure on a highly doped (9.10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">17</sup> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-3</sup> ) MBE-grown channel layer with 2600-cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /V.s mobility. The use of thin channels and a buried p-layer also reduced the output conductance and other short-channel effects dramatically. As a result, these scaled MESFET's are very promising for high-speed digital logic circuits.