Publication | Closed Access
High-T<sub>c</sub> Y-Ba-Cu-O Thin Films Prepared by Dual Magnetron Sputtering
31
Citations
3
References
1987
Year
Materials ScienceEngineeringDual MagnetronT C DegradationOxide ElectronicsApplied PhysicsSuperconductivitySemiconductor MaterialThin Film Process TechnologyMagnetic Thin FilmsThin FilmsEpitaxial GrowthBa 2Y-ba-cu-o Thin FilmsThin Film Processing
Y-Ba-Cu-O thin films (200-300 nm thick) have been magnetron-sputtered on heated sapphire substrates. By means of dual sputtering configuration with a Cu and sintered Y-Ba-Cu-O target, films having compositions closer to Y 1 Ba 2 Cu 3 O y are reproducibly obtained at a substrate temperature of about 600°C. They have a nearly single-phase perovskite-like structure with highly c -axis preferred orientation and show a T c onset of 90 K. Remarkable improvement in the zero resistivity temperature (up to 73 K) is achieved by subsequent annealing of these films at 550-650°C, while annealing at higher temperatures leads to T c degradation.
| Year | Citations | |
|---|---|---|
Page 1
Page 1