Osamu Michikami - Concepedia

Author

Osamu Michikami

NTT (Japan)

Also Known As

O Michikami, O. MICHIKAMI, O. Michikami, Osamu MICHIKAMI, Osamu Michikami, Osamu Michikami Osamu Michikami

152

Publications

1.3K

Citations

H-Index

Concepts

All Affiliations

NTT (Japan)Iwate University Advanced Science Research Center Japan Atomic Energy Agency RIKEN

About

Osamu Michikami is an author at NTT (Japan) specializing in applied physics, materials science, and engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	18	41	1K
2	Applied Physics	18	38	985
3	Electrical Engineering	10	10	243
4	Materials Engineering	9	9	328
5	Natural Sciences	2	2	56

Osamu Michikami

Publications

1.1K

Citations

H-Index

Page 1

	Year	Citations
Surface Damage on Si Substrates Caused by Reactive Sputter Etching Norikuni Yabumoto, Masaharu Oshima, Osamu Michikami, Japanese Journal of Applied Physics EngineeringRse ConditionsSurface IntegritySilicon On InsulatorDefect Tolerance	1981	114
Epitaxy and Orientation of Eu<sub>1</sub>Ba<sub>2</sub>Cu<sub>3</sub>O<sub>7-y</sub> Films Grown In Situ by Magnetron Sputtering H. Asano, Masayoshi Asahi, Osamu Michikami Japanese Journal of Applied Physics Superconducting MaterialEngineeringThin Film Process TechnologySitu GrowthMagnetism	1989	74
Synthesis of Y-Ba-Cu-O Thin Films on Sapphire Substrates by RF Magnetron Sputtering Osamu Michikami, H. Asano, Yujiro Katoh, Japanese Journal of Applied Physics EngineeringThin Film Process TechnologyCu ConcentrationChemical DepositionMagnetism	1987	70
Superconducting and Structural Properties of EuBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-δ</sub> Ultrathin Films Deposited on MgO(100) Substrates Using Magnetron Sputtering Osamu Michikami, Masayoshi Asahi, H. Asano Japanese Journal of Applied Physics Materials ScienceMagnetismStructural PropertiesUltrathin FilmsEngineering	1990	49
Study of structural change in CeO2 irradiated with high-energy ions by means of X-ray diffraction measurement N. Ishikawa, Y. Chimi, Osamu Michikami, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Materials ScienceEngineeringHigh-energy IonsX-ray DiffractionApplied Physics	2008	43
Epitaxial Growth of EuBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-y</sub> Films on YAlO<sub>3</sub> Single Crystals H. Asano, Shugo Kubo, Osamu Michikami, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringSuperconducting MaterialDielectric ConstantDesirable Dielectric Properties	1990	36
YBaCuO Epitaxial Film Formation by Magnetron Sputtering with Facing Targets I. Effects of Target and Substrate Positions Osamu Michikami, Masayoshi Asahi Japanese Journal of Applied Physics Magnetic PropertiesEngineeringFacing TargetsThin Film Process TechnologySubstrate Positions	1991	33
Epitaxial Growth of Sr<sub>x</sub>TiO<sub>y</sub> and Fabrication of EuBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-δ</sub>/Sr<sub>x</sub>TiO<sub>y</sub>/Pb Tunnel Junctions Osamu Michikami, Masayoshi Asahi Japanese Journal of Applied Physics Materials ScienceSemiconductorsOxide HeterostructuresEpitaxial GrowthEngineering	1991	32
High-T<sub>c</sub> Y-Ba-Cu-O Thin Films Prepared by Dual Magnetron Sputtering H. Asano, K. Tanabe, Yujiro Katoh, Japanese Journal of Applied Physics Materials ScienceEngineeringDual MagnetronT C DegradationOxide Electronics	1987	31
Oxygen defects created in CeO2 irradiated with 200 MeV Au ions K. Ohhara, N. Ishikawa, Y. Matsumoto, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms	2009	31

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