Publication | Closed Access
Fabrication of low-loss channel waveguides in Al2O3 and Y2O3 layers by inductively coupled plasma reactive ion etching
147
Citations
22
References
2007
Year
EngineeringApplied PhysicsY2o3 LayersLow-loss Channel WaveguidesMicroelectronicsPlasma EtchingOptoelectronicsPlanar Waveguide SensorPlasma Reactive Ion
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