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Electric conductivity of boron nitride thin films enhanced by <i>in situ</i> doping of zinc
106
Citations
22
References
2006
Year
Materials ScienceSemiconductorsElectrical EngineeringSitu DopingEngineeringElectronic MaterialsHexagonal Boron NitrideBoron NitrideCubic Boron NitrideApplied PhysicsQuantum MaterialsSemiconductor MaterialThin FilmsElectric ConductivityZinc Concentration
The authors demonstrate that the electric conductivities of cubic and hexagonal boron nitride (c-BN and h-BN) thin films increased markedly by the in situ doping of zinc. The doped films were electrically semiconducting, and conductivities at room temperature increased from 10−8to10−2Ω−1cm−1 with increasing zinc concentration from 400to20000ppm. Activation energies for electric conduction (Ec) of c-BN decreased from 0.3to0.1eV with increasing zinc concentration, suggesting feasible shallow-level doping. On the other hand, h-BN thin films showed approximately 0.1eV higher Ec than those of c-BN’s, due to the formation of defective B–B bonds.
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