Publication | Closed Access
Homoepitaxial growth of 4H-SiC on on-axis C-face substrates by chemical vapor depositon
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Citations
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References
2004
Year
Materials EngineeringMaterials ScienceEngineeringOn-axis C-face SubstratesSurface ScienceApplied PhysicsChemical Vapor DepositonSemiconductor Device FabricationMolecular Beam EpitaxyEpitaxial GrowthChemical Vapor DepositionCarbideHomoepitaxial Growth
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