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Influence of addition of indium and of post-annealing on structural, electrical and optical properties of gallium-doped zinc oxide thin films deposited by direct-current magnetron sputtering

Materials ScienceMaterials EngineeringElectrical EngineeringOptical MaterialsEngineeringApplied PhysicsGallium OxideSemiconductor MaterialThin FilmsGallium-doped ZincOptoelectronicsThin Film ProcessingDirect-current Magnetron Sputtering